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Business – HexaTech Introduces New 3-Inch Aluminum Nitride Substrate for Enhanced Performance

Article Summary:

HexaTech, Inc., based in Morrisville, N.C., has announced the commercial release of its new 3-inch diameter single crystal aluminum nitride (AlN) substrate. This product represents a significant milestone in the transition to 100 mm diameter substrates, which are essential for high-volume production of AlN-based electronic devices utilized in high voltage and high-frequency applications.

As a leading supplier of PVT-grown AlN substrates, HexaTech emphasizes exceptional structural and surface quality, reinforcing its commitment to cutting-edge performance. The launch of the 3-inch substrate is a critical step in advancing AlN technology and meeting the growing demand in the electronics market.

Original Article:

HexaTech Launches 3″ Diameter Aluminum Nitride Substrate Product

Targets Commercial-Scale Production of AlN-Based Technologies

MORRISVILLE, N.C., Feb. 10, 2026 /PRNewswire/ — HexaTech, Inc. announced today the immediate production release of its new 3-inch (76.2 mm) diameter single crystal aluminum nitride (AlN) substrate product. Three-inch diameter substrates are seen as a key transition milestone toward the realization of 100 mm diameter material, supporting future high-volume production of AlN-based high voltage and high frequency electronic devices. As the world’s leading commercial supplier of single crystal physical vapor transport (PVT)-grown AlN substrates, HexaTech is driving cutting-edge product performance coupled with production scale.

Image 1 – Full Substrate Optical Image
Image 1 – Full Substrate Optical Image

“With this 3-inch launch, HexaTech continues to build on its history of delivering AlN material with industry-leading structural and surface quality,…

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